Optical and electrical properties of nickel oxide thin films synthesized by sol-gel spin coating
Identifieur interne : 000103 ( Main/Exploration ); précédent : 000102; suivant : 000104Optical and electrical properties of nickel oxide thin films synthesized by sol-gel spin coating
Auteurs : M. Jlassi [Tunisie] ; I. Sta [Tunisie] ; M. Hajji [Tunisie] ; H. Ezzaouia [Tunisie]Source :
- Materials science in semiconductor processing [ 1369-8001 ] ; 2014.
Descripteurs français
- Pascal (Inist)
- Caractéristique optique, Propriété optique, Propriété électrique, Caractéristique électrique, Procédé sol gel, Revêtement centrifugation, Dépôt centrifugation, Verre spin, Recuit, Température air, Température recuit, Conductivité type p, Transparence, Optimisation, Epaisseur, Atmosphère contrôlée, Morphologie surface, Structure surface, Microscopie force atomique, Transmission optique, Spectre absorption, Oxyde de nickel, Couche mince, Matériau transparent, 7867, 6837P, 7840R, 7363.
English descriptors
- KwdEn :
- Absorption spectra, Air temperature, Annealing, Annealing temperature, Atomic force microscopy, Controlled atmospheres, Electrical characteristic, Electrical properties, Nickel oxide, Optical characteristic, Optical properties, Optical transmission, Optimization, P type conductivity, Sol-gel process, Spin glasses, Spin-on coating, Spin-on coatings, Surface morphology, Surface structure, Thickness, Thin films, Transparency, Transparent material.
Abstract
Nickel oxide thin films were prepared by the sol-gel technique combined with spin coating onto glass substrates. The as-deposited films were pre-heated at 275 °C for 15 min and then annealed in air at different temperatures. The effects of the annealing temperature on the structural and optical properties of the films are studied. The results show that 600 °C is the optimum annealing temperature for preparation of NiO films with p-type conductivity and high optical transparency. Then, by using these optimized deposition parameters, NiO thin films of various thicknesses were deposited at the same experimental conditions and annealed under different atmospheres. Surface morphology of the films was investigated by atomic force microscopy. The surface morphology of the films varies with the annealing atmosphere. Optical transmission was studied by UV-vis spectrophotometer. The transmittance of films decreased as the thickness of films increased. The electrical resistivity, obtained by four-point probe measurements, was improved when NiO layers were annealed in N2 atmosphere at 600 °C.
Affiliations:
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Le document en format XML
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<term>Annealing</term>
<term>Annealing temperature</term>
<term>Atomic force microscopy</term>
<term>Controlled atmospheres</term>
<term>Electrical characteristic</term>
<term>Electrical properties</term>
<term>Nickel oxide</term>
<term>Optical characteristic</term>
<term>Optical properties</term>
<term>Optical transmission</term>
<term>Optimization</term>
<term>P type conductivity</term>
<term>Sol-gel process</term>
<term>Spin glasses</term>
<term>Spin-on coating</term>
<term>Spin-on coatings</term>
<term>Surface morphology</term>
<term>Surface structure</term>
<term>Thickness</term>
<term>Thin films</term>
<term>Transparency</term>
<term>Transparent material</term>
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<keywords scheme="Pascal" xml:lang="fr"><term>Caractéristique optique</term>
<term>Propriété optique</term>
<term>Propriété électrique</term>
<term>Caractéristique électrique</term>
<term>Procédé sol gel</term>
<term>Revêtement centrifugation</term>
<term>Dépôt centrifugation</term>
<term>Verre spin</term>
<term>Recuit</term>
<term>Température air</term>
<term>Température recuit</term>
<term>Conductivité type p</term>
<term>Transparence</term>
<term>Optimisation</term>
<term>Epaisseur</term>
<term>Atmosphère contrôlée</term>
<term>Morphologie surface</term>
<term>Structure surface</term>
<term>Microscopie force atomique</term>
<term>Transmission optique</term>
<term>Spectre absorption</term>
<term>Oxyde de nickel</term>
<term>Couche mince</term>
<term>Matériau transparent</term>
<term>7867</term>
<term>6837P</term>
<term>7840R</term>
<term>7363</term>
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<front><div type="abstract" xml:lang="en">Nickel oxide thin films were prepared by the sol-gel technique combined with spin coating onto glass substrates. The as-deposited films were pre-heated at 275 °C for 15 min and then annealed in air at different temperatures. The effects of the annealing temperature on the structural and optical properties of the films are studied. The results show that 600 °C is the optimum annealing temperature for preparation of NiO films with p-type conductivity and high optical transparency. Then, by using these optimized deposition parameters, NiO thin films of various thicknesses were deposited at the same experimental conditions and annealed under different atmospheres. Surface morphology of the films was investigated by atomic force microscopy. The surface morphology of the films varies with the annealing atmosphere. Optical transmission was studied by UV-vis spectrophotometer. The transmittance of films decreased as the thickness of films increased. The electrical resistivity, obtained by four-point probe measurements, was improved when NiO layers were annealed in N<sub>2</sub>
atmosphere at 600 °C.</div>
</front>
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